X-Ray Photoelectron Spectrometer (PHI)
XPS : X-Ray photoelectron Spectroscopy or Electron spectroscopy for chemical analysis (ESCA) is an advanced surface analysis technique used to obtain chemical information about the surfaces of solid materials. The method uses an x-ray beam that excites solid samples to scatter photoelectrons.
The ESCA spectrum gives information about the chemical environment and oxidation state of the element. Atoms associated with different chemical environments produce energy peaks with low differential binding energies called chemical shifts. Separate chemical states with close energies are separated from each other using peak detection programs that give the content of each state as a percentage.
Instrument: PHI 5000 VersaProbe
XPS spectrometer has an argon ion gun that allows depth analysis on the sample surface and substrates. Also, thanks to the dual source charge neutralization patented by PHI, there is no need for sample-to-sample adjustment and masking of insulating materials. The X-ray beam can focus from 10 μm to 200 μm.
Specifications
Proprietary scanning X-Ray imaging (SXI™)
The VersaProbe device has a unique imaging system that enables the visualization of secondary electrons produced by X-Ray of the sample surface. Thanks to this unique feature, the electrons produced by scanning X-Ray are collected by the VersaProbe energy analyzer and allow us to obtain information about the topology and surface chemistry of the sample surface in a short time.
Ion gun can be used in routine thin film analysis with high layer removal and abrasion rates in the range of 1 to 5 KeV.
Angle Dependent Analysis (ADXPS)
With the specially designed angle dependent sample holder, atomic angle dependent measurements can be made, the angle range r can be changed from 0° to 90°(photoelectron take-off angle).
The PHI VersaProbe has a motorized five-axis sample loading chamber and sample holders with 25 mm and 60 mm diameters, and samples with a thickness of 7 mm can be accepted for analysis.
Accessories :
PHI VewrsaProbe Ultraviolet (UV) Photon Source
The additional UV source allows us to measure the valence band and fermi edge thanks to low energy photons. Any of He, Ne, Ar, Kr, and Xe gases can be used for one or more ionized UV photon sources.
Sample Requirements
The sample size can be in the range of a circle with a maximum diameter of 2 inches or 1 inch, but with a maximum thickness of 7 mm. It is useful to contact the sample acceptance office for minimum sample sizes. Sample surfaces should be clean and should not contain substances with high vapor pressure. Samples to be delivered must be coded starting from one and the surface to be measured (Bottom-Top) must be specified.
Applications
- Determination of elemental contents (other than H and He) on the surface of materials (eg polymer, glass).
- Determination of chemical states of elements.
- Depth profile
- Chemical status information
XPS : X-Ray photoelectron Spectroscopy or Electron spectroscopy for chemical analysis (ESCA) is an advanced surface analysis technique used to obtain chemical information about the surfaces of solid materials. The method uses an x-ray beam that excites solid samples to scatter photoelectrons.
The ESCA spectrum gives information about the chemical environment and oxidation state of the element. Atoms associated with different chemical environments produce energy peaks with low differential binding energies called chemical shifts. Separate chemical states with close energies are separated from each other using peak detection programs that give the content of each state as a percentage.
Instrument: PHI 5000 VersaProbe
XPS spectrometer has an argon ion gun that allows depth analysis on the sample surface and substrates. Also, thanks to the dual source charge neutralization patented by PHI, there is no need for sample-to-sample adjustment and masking of insulating materials. The X-ray beam can focus from 10 μm to 200 μm.
Specifications
Proprietary scanning X-Ray imaging (SXI™)
The VersaProbe device has a unique imaging system that enables the visualization of secondary electrons produced by X-Ray of the sample surface. Thanks to this unique feature, the electrons produced by scanning X-Ray are collected by the VersaProbe energy analyzer and allow us to obtain information about the topology and surface chemistry of the sample surface in a short time.
Ion gun can be used in routine thin film analysis with high layer removal and abrasion rates in the range of 1 to 5 KeV.
Angle Dependent Analysis (ADXPS)
With the specially designed angle dependent sample holder, atomic angle dependent measurements can be made, the angle range r can be changed from 0° to 90°(photoelectron take-off angle).
The PHI VersaProbe has a motorized five-axis sample loading chamber and sample holders with 25 mm and 60 mm diameters, and samples with a thickness of 7 mm can be accepted for analysis.
Accessories :
PHI VewrsaProbe Ultraviolet (UV) Photon Source
The additional UV source allows us to measure the valence band and fermi edge thanks to low energy photons. Any of He, Ne, Ar, Kr, and Xe gases can be used for one or more ionized UV photon sources.
Sample Requirements
The sample size can be in the range of a circle with a maximum diameter of 2 inches or 1 inch, but with a maximum thickness of 7 mm. It is useful to contact the sample acceptance office for minimum sample sizes. Sample surfaces should be clean and should not contain substances with high vapor pressure. Samples to be delivered must be coded starting from one and the surface to be measured (Bottom-Top) must be specified.
Applications
- Determination of elemental contents (other than H and He) on the surface of materials (eg polymer, glass).
- Determination of chemical states of elements.
- Depth profile
- Chemical status information