Time of Flight-Secondary Ion Mass Spectrometer (TOF-SIMS)
Instrument: ION-TOF ToF-SIMS 5
Secondary ion mass spectroscopy (SIMS) is a very sensitive surface analytical technique that provides elemental and molecular information about solid surfaces by blasting samples with a focused primary ion beam with a few keV energy and analyzing the secondary ions emitted from the surface of the samples. Secondary ions emitted from the surface are analyzed by time-of-flight mass spectrometry.
The different types of analysis described below can be applied.
Surface Spectroscopy
Provides detailed elemental and molecular information about the outermost monolayers using very low primary ion density
High sensitivity - in the ppm/ppb range
High mass range and resolution
Surface Imaging
Mass resolution secondary ion images (chemical map) can be obtained by scanning the surface with a well-focused ion beam (electron microprobe).
High lateral resolution (<60 nm)
Fast image detection (up to 50kHz pixel frequency)
Field of view - µm2- cm2
Depth profile
It operates in dual-beam mode, the primary beam sputtering the cavity while the secondary beam analyzes the cavity bottom.
Depth resolution - better than 1 nm
High mass resolution
Spray rate up to 10 µm/h
Ideal for insulating materials.
3-Dimensional Analysis
It combines spectral, imaging and depth information. It is used in the following applications:
manufactured structures; TFT screens...
defect analysis; embedded particles...
Material science; grain boundary, diffusion...
Instrument: ION-TOF ToF-SIMS 5
Secondary ion mass spectroscopy (SIMS) is a very sensitive surface analytical technique that provides elemental and molecular information about solid surfaces by blasting samples with a focused primary ion beam with a few keV energy and analyzing the secondary ions emitted from the surface of the samples. Secondary ions emitted from the surface are analyzed by time-of-flight mass spectrometry.
The different types of analysis described below can be applied.
Surface Spectroscopy
Provides detailed elemental and molecular information about the outermost monolayers using very low primary ion density
High sensitivity - in the ppm/ppb range
High mass range and resolution
Surface Imaging
Mass resolution secondary ion images (chemical map) can be obtained by scanning the surface with a well-focused ion beam (electron microprobe).
High lateral resolution (<60 nm)
Fast image detection (up to 50kHz pixel frequency)
Field of view - µm2- cm2
Depth profile
It operates in dual-beam mode, the primary beam sputtering the cavity while the secondary beam analyzes the cavity bottom.
Depth resolution - better than 1 nm
High mass resolution
Spray rate up to 10 µm/h
Ideal for insulating materials.
3-Dimensional Analysis
It combines spectral, imaging and depth information. It is used in the following applications:
manufactured structures; TFT screens...
defect analysis; embedded particles...
Material science; grain boundary, diffusion...